Invention Application
- Patent Title: GAS SENSOR AND METHOD FOR MANUFACTURING THE GAS SENSOR
- Patent Title (中): 气体传感器和制造气体传感器的方法
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Application No.: US14097677Application Date: 2013-12-05
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Publication No.: US20140093992A1Publication Date: 2014-04-03
- Inventor: Koichiro KAMATA
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi
- Priority: JP2010-133916 20100611
- Main IPC: G01N27/414
- IPC: G01N27/414 ; H01L29/66

Abstract:
It is an object to provide a gas sensor which is formed by a simple manufacturing process. Another object is to provide a gas sensor whose manufacturing cost is reduced. A transistor which includes an oxide semiconductor layer in contact with a gas and which serves as a detector element of a gas sensor, and a transistor which includes an oxide semiconductor layer in contact with a film having a gas barrier property and which forms a detection circuit are formed over one substrate by the same process, whereby a gas sensor using these transistors may be formed.
Public/Granted literature
- US09046482B2 Gas sensor and method for manufacturing the gas sensor Public/Granted day:2015-06-02
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