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Invention Application
US20140097352A1 Charged practicles beam apparatus and charged particles beam apparatus design method 有权
带电粒子束装置和带电粒子束装置设计方法

  • Patent Title: Charged practicles beam apparatus and charged particles beam apparatus design method
  • Patent Title (中): 带电粒子束装置和带电粒子束装置设计方法
  • Application No.: US13573696
    Application Date: 2012-10-04
  • Publication No.: US20140097352A1
    Publication Date: 2014-04-10
  • Inventor: Mamoru Nakasuji
  • Applicant: Mamoru Nakasuji
  • Main IPC: G21K5/00
  • IPC: G21K5/00
Charged practicles beam apparatus and charged particles beam apparatus design method
Abstract:
Problems to be solved: To obtain higher brightness than Langmuir limit. Adjust brightness to the optimum value.Method of resolution: To obtain such beams, the following means and methods are effective. A charged particles beam apparatus consisting of a charged particle source, a beam drawing electrode, and a beam control electrode, wherein; after the charged particles beam source a condenser lens is designed, and brightness of the charged particles beam is adjusted by adjusting a magnification factor of said condenser lens.
Abstract(Chinese):

要解决的问题：获得比朗缪尔限制更高的亮度。 将亮度调整到最佳值。 解决方法：要获得这​​样的梁，以下手段和方法是有效的。 一种带电粒子束装置，由带电粒子源，射束电极和光束控制电极组成，其中： 在带电粒子束源设计聚光透镜之后，通过调整所述聚光透镜的放大系数来调节带电粒子束的亮度。

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