发明申请
US20140117574A1 Strain and Kinetics Control During Separation Phase of Imprint Process
审中-公开
压印过程分离阶段的应变和动力学控制
- 专利标题： Strain and Kinetics Control During Separation Phase of Imprint Process
- 专利标题（中）： 压印过程分离阶段的应变和动力学控制
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申请号： US14150261申请日： 2014-01-08
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公开(公告)号： US20140117574A1公开(公告)日： 2014-05-01
- 发明人: Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung- Jin Choi
- 申请人： Niyaz Khusnatdinov , Frank Y. Xu , Mario Johannes Meissl , Michael N. Miller , Ecron D. Thompson , Gerard M. Schmid , Pawan Kumar Nimmakayala , Xiaoming Lu , Byung- Jin Choi
- 申请人地址： US TX Austin
- 专利权人： Molecular Imprints, Inc.
- 当前专利权人： Molecular Imprints, Inc.
- 当前专利权人地址： US TX Austin
- 主分类号： B29C37/00
- IPC分类号： B29C37/00 ; B82Y40/00
摘要：
Systems and methods for improving robust layer separation during the separation process of an imprint lithography process are described. Included are methods of matching strains between a substrate to be imprinted and the template, varying or modifying the forces applied to the template and/or the substrate during separation, or varying or modifying the kinetics of the separation process.
公开/授权文献
- US3128320A Gas washing with liquid spray 公开/授权日：1964-04-07
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