Invention Application
- Patent Title: HYPERSPECTRAL IMAGING SYSTEM, MONOLITHIC SPECTROMETER AND METHODS FOR MANUFACTURING THE MONOLITHIC SPECTROMETER
- Patent Title (中): 超分辨率成像系统,单片光谱仪及其制造方法
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Application No.: US14048518Application Date: 2013-10-08
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Publication No.: US20140118738A1Publication Date: 2014-05-01
- Inventor: Lovell Elgin Comstock, II , Richard Lynton Wiggins
- Applicant: CORNING INCORPORATED
- Applicant Address: US NY CORNING
- Assignee: CORNING INCORPORATED
- Current Assignee: CORNING INCORPORATED
- Current Assignee Address: US NY CORNING
- Main IPC: G01J3/28
- IPC: G01J3/28

Abstract:
A hyperspectral imaging system, a monolithic Offner spectrometer, and two methods for manufacturing the monolithic Offner spectrometer are described herein. In one embodiment, the monolithic Offner spectrometer comprises a transmissive material which has: (1) an entrance surface which has an opaque material applied thereto, where the opaque material has a portion removed therefrom which forms a slit; (2) a first surface which has a first reflective coating applied thereto to form a first mirror; (3) a second surface which has a second reflective coating applied thereto to form a diffraction grating; (4) a third surface which has a third reflective coating applied thereto to form a second mirror; and (5) an exit surface.
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