Invention Application
US20140130692A1 COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE
审中-公开
用于激光雕刻的组合物，用于激光雕刻的缓冲印刷板前驱物及其制造方法，用于制备可靠印刷板的工艺以及可靠印刷板
- Patent Title: COMPOSITION FOR LASER ENGRAVING, RELIEF PRINTING PLATE PRECURSOR FOR LASER ENGRAVING AND PROCESS FOR PRODUCING SAME, PROCESS FOR MAKING RELIEF PRINTING PLATE, AND RELIEF PRINTING PLATE
- Patent Title (中): 用于激光雕刻的组合物，用于激光雕刻的缓冲印刷板前驱物及其制造方法，用于制备可靠印刷板的工艺以及可靠印刷板
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Application No.: US14160697Application Date: 2014-01-22
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Publication No.: US20140130692A1Publication Date: 2014-05-15
- Inventor: Kenta YOSHIDA
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2011-165413 20110728
- Main IPC: B41N1/12
- IPC: B41N1/12 ; B29C59/16 ; C08F20/34
Abstract:
To provide a composition for laser engraving that can give a relief printing plate having excellent ink laydown and that has excellent rinsing properties after laser engraving.A composition for laser engraving, the composition that comprises (Component A) an acrylate oligomer; (Component B) a thermopolymerization initiator; and (Component C) at least one of the compounds represented by Formula (1) to Formula (7); the composition not comprising or comprising at more than 0 mass % but less than 2 mass % relative to the total mass of the composition (Component D) a resin having a weight-average molecular weight of at least 10,000, wherein R1 to R18 independently denote a hydrogen atom, an alkyl group, a substituted alkyl group, an aryl group, a substituted aryl group, a heterocyclic group, or a substituted heterocyclic group, L2 denotes a divalent organic group, L3 denotes a trivalent organic group, and L4 denotes a tetravalent organic group.
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