发明申请
US20140134791A1 Solution-Processed Metal-Selenide Semiconductor Using Selenium Nanoparticles
有权
使用硒纳米颗粒的溶液加工的金属硒化物半导体
- 专利标题: Solution-Processed Metal-Selenide Semiconductor Using Selenium Nanoparticles
- 专利标题(中): 使用硒纳米颗粒的溶液加工的金属硒化物半导体
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申请号: US13674005申请日: 2012-11-10
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公开(公告)号: US20140134791A1公开(公告)日: 2014-05-15
- 发明人: Sean Andrew VAIL , Alexey KOPOSOV , Jong-Jan LEE
- 申请人: Sean Andrew VAIL , Alexey KOPOSOV , Jong-Jan LEE
- 主分类号: H01L21/02
- IPC分类号: H01L21/02
摘要:
A method is provided for forming a solution-processed metal and mixed-metal selenide semiconductor using selenium (Se) nanoparticles (NPs). The method forms a first solution including SeNPs dispersed in a solvent. Added to the first solution is a second solution including a first material set of metal salts, metal complexes, or combinations thereof, which are dissolved in a solvent, forming a third solution. The third solution is deposited on a conductive substrate, forming a first intermediate film comprising metal precursors, from corresponding members of the first material set, and embedded SeNPs. As a result of thermally annealing, the metal precursors are transformed and the first intermediate film is selenized, forming a first metal selenide-containing semiconductor. In one aspect, the first solution further comprises ligands for the stabilization of SeNPs, which are liberated during thermal annealing. In another aspect, the metal selenide-containing semiconductor comprises copper, indium, gallium diselenide (CIGS).
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