Invention Application
- Patent Title: PULSED PLASMA LUBRICATION DEVICE AND METHOD
- Patent Title (中): 脉冲等离子体润滑装置和方法
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Application No.: US14151684Application Date: 2014-01-09
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Publication No.: US20140190771A1Publication Date: 2014-07-10
- Inventor: Richard R. Hofer , Donald B. Bickler , Saverio A. D'Agostino
- Applicant: United States of America as Represented by the Administrator of NASA
- Applicant Address: US DC Washington
- Assignee: United States of America as Represented by the Administrator of NASA
- Current Assignee: United States of America as Represented by the Administrator of NASA
- Current Assignee Address: US DC Washington
- Main IPC: F16N39/00
- IPC: F16N39/00

Abstract:
Disclosed herein is a lubrication device comprising a solid lubricant disposed between and in contact with a first electrode and a second electrode dimensioned and arranged such that application of an electric potential between the first electrode and the second electrode sufficient to produce an electric arc between the first electrode and the second electrode to produce a plasma in an ambient atmosphere at an ambient pressure which vaporizes at least a portion of the solid lubricant to produce a vapor stream comprising the solid lubricant. Methods to lubricate a surface utilizing the lubrication device in-situ are also disclosed.
Public/Granted literature
- US09488312B2 Pulsed plasma lubrication device and method Public/Granted day:2016-11-08
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