Invention Application
- Patent Title: Method and System for Universal Target Based Inspection and Metrology
- Patent Title (中): 通用目标检测和计量方法与系统
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Application No.: US14083126Application Date: 2013-11-18
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Publication No.: US20140199791A1Publication Date: 2014-07-17
- Inventor: Allen Park , Ellis Chang , Michael Adel , Kris Bhaskar , Ady Levy , Amir Widmann , Mark Wagner , Songnian Rong
- Applicant: KLA-Tencor Corporation
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Corporation
- Current Assignee: KLA-Tencor Corporation
- Current Assignee Address: US CA Milpitas
- Main IPC: H01L21/66
- IPC: H01L21/66 ; G06F17/50

Abstract:
Universal target based inspection drive metrology includes designing a plurality of universal metrology targets measurable with an inspection tool and measurable with a metrology tool, identifying a plurality of inspectable features within at least one die of a wafer using design data, disposing the plurality of universal targets within the at least one die of the wafer, each universal target being disposed at least proximate to one of the identified inspectable features, inspecting a region containing one or more of the universal targets with an inspection tool, identifying one or more anomalistic universal targets in the inspected region with an inspection tool and, responsive to the identification of one or more anomalistic universal targets in the inspected region, performing one or more metrology processes on the one or more anomalistic universal metrology targets with the metrology tool.
Public/Granted literature
- US09576861B2 Method and system for universal target based inspection and metrology Public/Granted day:2017-02-21
Information query
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