Invention Application
- Patent Title: APPARATUS FOR MODELING OF FINFET WIDTH QUANTIZATION
- Patent Title (中): FINFET宽度量化建模设备
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Application No.: US13970806Application Date: 2013-08-20
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Publication No.: US20140201700A1Publication Date: 2014-07-17
- Inventor: Wilfried Ernest-August HAENSCH , Chung-Hsun Lin , Philip J. Oldiges , Hailing Wang , Richard Q. Williams
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method for modeling FinFET width quantization is described. The method includes fitting a FinFET model of a FinFET device to single fin current/voltage characteristics. The FinFET device comprises a plurality of fins. The method includes obtaining statistical data of at least one sample FinFET device. The statistical data includes DIBL data and SS data. The method also includes fitting the FinFET model to a variation in a current to turn off the finFETs device (IOFF) in the statistical data using the DIBL data and the SS data and determining a model for a voltage to turn off the finFETs device (VOFF). The method also includes fitting the FinFET model to the VOFF.
Public/Granted literature
- US08806419B2 Apparatus for modeling of FinFET width quantization Public/Granted day:2014-08-12
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