Invention Application
US20140208949A1 GAS SEPARATION MEMBRANE, METHOD OF PRODUCING THE SAME, AND GAS SEPARATING MEMBRANE MODULE USING THE SAME
审中-公开
气体分离膜，其制造方法和使用该气体分离膜的气体分离膜模块
- Patent Title: GAS SEPARATION MEMBRANE, METHOD OF PRODUCING THE SAME, AND GAS SEPARATING MEMBRANE MODULE USING THE SAME
- Patent Title (中): 气体分离膜，其制造方法和使用该气体分离膜的气体分离膜模块
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Application No.: US14227384Application Date: 2014-03-27
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Publication No.: US20140208949A1Publication Date: 2014-07-31
- Inventor: Kenichi ISHIZUKA , Shigehide ITOU
- Applicant: FUJIFILM CORPORATION
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM CORPORATION
- Current Assignee: FUJIFILM CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP2011-217159 20110930
- Main IPC: B01D71/70
- IPC: B01D71/70
Abstract:
A gas separation membrane, containing: a support; and a separating layer formed on the support, the separating layer containing a resin; the separating layer containing, at the side thereof opposite to the support, a hydrophilic modification treatment surface, the hydrophilic modification treatment surface involved in a layer having a film thickness of 0.1 μm or less, and the hydrophilic modification treatment surface provided with a surface contact angle measured by using water thereon in the range of 60 degrees or less.
Information query
