发明申请
US20140242884A1 SYNETHETIC QUARTZ GLASS SUBTRATE POLISHING SLURRY AND MANUFACTURE OF SYNETHETIC QUARTZ GLASS SUBSTRATE USING THE SAME
审中-公开
SYNETHETIC QUARTZ玻璃剥离抛光浆料和使用它的SYNETHETIC QUARTZ玻璃基材的制造
- 专利标题： SYNETHETIC QUARTZ GLASS SUBTRATE POLISHING SLURRY AND MANUFACTURE OF SYNETHETIC QUARTZ GLASS SUBSTRATE USING THE SAME
- 专利标题（中）： SYNETHETIC QUARTZ玻璃剥离抛光浆料和使用它的SYNETHETIC QUARTZ玻璃基材的制造
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申请号： US14269694申请日： 2014-05-05
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公开(公告)号： US20140242884A1公开(公告)日： 2014-08-28
- 发明人: Harunobu MATSUI , Daijitsu HARADA , Masaki TAKEUCHI
- 申请人： SHIN-ETSU CHEMICAL CO., LTD.
- 申请人地址： JP Tokyo
- 专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人： SHIN-ETSU CHEMICAL CO., LTD.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2010-166893 20100726
- 主分类号： B24B1/00
- IPC分类号： B24B1/00
摘要：
A polishing slurry comprising a collagen derivative and a colloidal solution is effective for polishing of synthetic quartz glass substrates. It prevents formation of defects having a size that can be detected by a high-sensitivity flaw detector.
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