发明申请
US20140246744A1 METHOD OF MANUFACTURING RADIATION DETECTOR AND RADIATION DETECTOR
审中-公开
制造辐射探测器和辐射探测器的方法
- 专利标题: METHOD OF MANUFACTURING RADIATION DETECTOR AND RADIATION DETECTOR
- 专利标题(中): 制造辐射探测器和辐射探测器的方法
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申请号: US14009210申请日: 2012-03-19
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公开(公告)号: US20140246744A1公开(公告)日: 2014-09-04
- 发明人: Masatomo Kaino , Satoshi Tokuda , Toshinori Yoshimuta , Hiroyuki Kishihara , Akina Yoshimatsu , Toshiyuki Sato , Shoji Kuwabara
- 申请人: Masatomo Kaino , Satoshi Tokuda , Toshinori Yoshimuta , Hiroyuki Kishihara , Akina Yoshimatsu , Toshiyuki Sato , Shoji Kuwabara
- 申请人地址: JP Kyoto-shi, Kyoto
- 专利权人: SHIMADZU CORPORATION
- 当前专利权人: SHIMADZU CORPORATION
- 当前专利权人地址: JP Kyoto-shi, Kyoto
- 优先权: JP2011-081785 20110401
- 国际申请: PCT/JP2012/001894 WO 20120319
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; H01L31/0272
摘要:
A graphite substrate is accommodated into a chamber where vacuum drawing is performed via a pump. Thereafter, carbon is heated under vacuum, whereby impurities in the carbon are evaporated causing the carbon to be purified. The carbon in the graphite substrate is purified, achieving suppression of the impurities as donor/acceptor elements and also metallic elements in the semiconductor layer of 0.1 ppm or less, the impurities being contained in the carbon in the graphite substrate. As a result, occurrence of leak current or an abnormal leak point enables to be suppressed, and thus abnormal crystal growth in the semiconductor layer enables to be suppressed.
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