Invention Application
- Patent Title: SAPPHIRE PROPERTY MODIFICATION THROUGH ION IMPLANTATION
- Patent Title (中): 通过离子植入进行SAPPHIRE物业修改
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Application No.: US13783264Application Date: 2013-03-02
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Publication No.: US20140248472A1Publication Date: 2014-09-04
- Inventor: Dale N. Memering , Christopher D. Prest , Douglas Weber
- Applicant: APPLE INC.
- Applicant Address: US CA Cupertino
- Assignee: Apple Inc.
- Current Assignee: Apple Inc.
- Current Assignee Address: US CA Cupertino
- Main IPC: C23C14/48
- IPC: C23C14/48 ; C03C21/00

Abstract:
Systems and methods for strengthening a sapphire part are described herein. One method may take the form of orienting a first surface of a sapphire member relative to an ion implantation device, selecting an ion implantation concentration and directing ions at the first surface of the sapphire member. The ions are embedded under the first surface to create compressive stress in the sapphire surface.
Public/Granted literature
- US09416442B2 Sapphire property modification through ion implantation Public/Granted day:2016-08-16
Information query
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