Invention Application
- Patent Title: METHOD AND APPARATUS OF DIAGNOSING PLASMA IN PLASMA SPACE
- Patent Title (中): 在等离子体空间中诊断等离子体的方法和装置
-
Application No.: US14200318Application Date: 2014-03-07
-
Publication No.: US20140253092A1Publication Date: 2014-09-11
- Inventor: Kyung-Yub JEON , Jeong-Yun LEE , Chin-Wook CHUNG
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: KR Suwon-Si
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-Si
- Priority: KR10-2013-0025384 20130311
- Main IPC: G01N27/00
- IPC: G01N27/00

Abstract:
To diagnose plasma in a plasma space, a plurality of floating probes are installed at a plurality of points, respectively, in a plasma space. An electron density ratio at each of the points is calculated by measuring a first probe current of each of the floating probes, the probe current including a DC component. A point ion density and a point electron temperature at each of the points are calculated by measuring a second probe current of each of the floating probes before the electron density ratio is calculated, the second probe current excluding the DC component.
Public/Granted literature
- US09754770B2 Method and apparatus of diagnosing plasma in plasma space Public/Granted day:2017-09-05
Information query