发明申请
- 专利标题: LIFT MECHANISM FOR A GLASS SUBSTRATE IN AN EXPOSURE MACHINE
- 专利标题(中): 曝光机中玻璃基板的提升机构
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申请号: US14112943申请日: 2013-06-25
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公开(公告)号: US20140286735A1公开(公告)日: 2014-09-25
- 发明人: Xiaocheng Liu
- 申请人: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 申请人地址: CN Shenzhen, Guangdong
- 专利权人: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 当前专利权人: SHENZHEN CHINA STAR OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 当前专利权人地址: CN Shenzhen, Guangdong
- 优先权: CN201320126319.X 20130319
- 国际申请: PCT/CN2013/077840 WO 20130625
- 主分类号: B25B11/00
- IPC分类号: B25B11/00 ; B66F7/00
摘要:
A lift mechanism for a glass substrate in an exposure machine is provided, which comprises a base, a lift platform mounted on the top of the base and used to lift the glass substrate, lift bars mounted on the perimeter of the base, and at least one adsorbing devices mounted above the glass substrate; the lift bars are used to lift the perimeter of the glass substrate; each of the adsorbing devices is used to adsorb the upper surface of the substrate and able to move along the vertical direction and the horizontal direction. The lift mechanism for the glass substrate comprises a lift platform, and it has good integrality and uniform temperature, which is benefit for the HVA optically aligning of the glass substrate. Furthermore, the switch between the two-part lift method and the three-part lift method will be simple and with high working efficiency.
公开/授权文献
- US09352943B2 Lift mechanism for a glass substrate in an exposure machine 公开/授权日:2016-05-31
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