Invention Application
- Patent Title: METHODS FOR MODELING OF FINFET WIDTH QUANTIZATION
- Patent Title (中): FINFET宽度量化建模方法
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Application No.: US14317013Application Date: 2014-06-27
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Publication No.: US20140310676A1Publication Date: 2014-10-16
- Inventor: Wilfried Ernest-August Haensch , Chung-Hsun Lin , Philip J. Oldiges , Hailing Wang , Richard Q. Williams
- Applicant: International Business Machines Corporation
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method for modeling FinFET width quantization is described. The method includes fitting a FinFET model of a FinFET device to single fin current/voltage characteristics. The FinFET device comprises a plurality of fins The method includes obtaining statistical data of at least one sample FinFET device. The statistical data includes DIBL data and SS data. The method also includes fitting the FinFET model to a variation in a current to turn off the finFETs device (IOFF) in the statistical data using the DIBL data and the SS data and determining a model for a voltage to turn off the finFETs device (VOFF). The method also includes fitting the FinFET model to the VOFF.
Public/Granted literature
- US09058441B2 Methods for modeling of FinFET width quantization Public/Granted day:2015-06-16
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