发明申请
- 专利标题: POLISHING FILM
- 专利标题(中): 抛光膜
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申请号: US14238324申请日: 2012-04-18
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公开(公告)号: US20140311044A1公开(公告)日: 2014-10-23
- 发明人: Toshikazu Taura , Kazuo Saito , Fumihiro Mukai
- 申请人: Toshikazu Taura , Kazuo Saito , Fumihiro Mukai
- 申请人地址: JP Kobe-shi, Hyogo
- 专利权人: BANDO CHEMICAL INDUSTRIES, LTD.
- 当前专利权人: BANDO CHEMICAL INDUSTRIES, LTD.
- 当前专利权人地址: JP Kobe-shi, Hyogo
- 优先权: JP2011-097648 20110425
- 国际申请: PCT/JP2012/002703 WO 20120418
- 主分类号: B24D3/28
- IPC分类号: B24D3/28
摘要:
The present invention provides a polishing film with which, even when water containing impurity ions is used as a polishing liquid, the abrasive particles comprising SiO2 are less apt to adhere to the polished surface, e.g., the polished surface of an end of an optical fiber itself, and which is less apt to cause the optical loss attributable to scratches or edge chips in the polished surface. The polishing film hence renders good finish-polishing quality possible. This polishing film is characterized by comprising a substrate and an abrasive layer which has been disposed on a surface of the substrate and which comprises abrasive particles comprising SiO2, a binder resin, and an adhesion inhibitor containing a phosphorus compound.
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