发明申请
US20140325822A1 Method and Apparatus for Tensioning a Shadow Mask for Thin Film Deposition 有权
用于张贴薄膜沉积阴影掩模的方法和装置

  • 专利标题: Method and Apparatus for Tensioning a Shadow Mask for Thin Film Deposition
  • 专利标题(中): 用于张贴薄膜沉积阴影掩模的方法和装置
  • 申请号: US14265773
    申请日: 2014-04-30
  • 公开(公告)号: US20140325822A1
    公开(公告)日: 2014-11-06
  • 发明人: Brian Arthur Bucci
  • 申请人: ADVANTECH GLOBAL, LTD
  • 申请人地址: VG Tortola
  • 专利权人: ADVANTECH GLOBAL, LTD
  • 当前专利权人: ADVANTECH GLOBAL, LTD
  • 当前专利权人地址: VG Tortola
  • 主分类号: B05B15/04
  • IPC分类号: B05B15/04
Method and Apparatus for Tensioning a Shadow Mask for Thin Film Deposition
摘要:
In a method and apparatus for shadow mask tensioning, a shadow mask frame and an anchor frame are positioned in spaced relation defining a gap therebetween and a shadow mask is positioned on the shadow mask frame and the anchor frame with an interior portion of the shadow mask extending across the gap. An edge of the shadow mask is affixed to the anchor frame and the shadow mask is tensioned by urging the interior portion of the shadow mask into the gap. Once the shadow mask has been tensioned to a desired extent, the shadow mask is affixed to the shadow mask frame. Thereafter, the combination of the shadow mask affixed to the shadow mask frame is separated from the anchor frame.
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