Invention Application
- Patent Title: System and Method for Treating Water Systems with High Voltage Discharge and Ozone
- Patent Title (中): 用高压放电和臭氧处理水系统的系统和方法
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Application No.: US14260605Application Date: 2014-04-24
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Publication No.: US20140326681A1Publication Date: 2014-11-06
- Inventor: Adrian J. Denvir , David F. Vela , Matt M. Holloway
- Applicant: NCH CORPORATION
- Applicant Address: US TX Irving
- Assignee: NCH CORPORATION
- Current Assignee: NCH CORPORATION
- Current Assignee Address: US TX Irving
- Main IPC: C02F1/467
- IPC: C02F1/467 ; C02F1/46

Abstract:
A system and method for treating flowing water systems with a plasma discharge to remove or control growth of microbiological species. The system and method protect other components of the water system from being damaged by excess energy from the electrohydraulic treatment. The system and method also recycle ozone gas generated by a high voltage generator that powers the plasma discharge to further treat the water. A gas infusion system upstream of or inside a plasma reaction chamber may be used to create fine bubbles of ozone, air, or other gases in the water being treated to aid in plasma generation.
Public/Granted literature
- US09868653B2 System and method for treating water systems with high voltage discharge and ozone Public/Granted day:2018-01-16
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