发明申请
- 专利标题: APPARATUS FOR SUBSTRATE DOUBLE-SURFACE HOLE-FILLING
- 专利标题(中): 用于基板双面表面孔填充的装置
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申请号: US13968354申请日: 2013-08-15
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公开(公告)号: US20140373776A1公开(公告)日: 2014-12-25
- 发明人: Sheng Zhang , Yulong Gao
- 申请人: Nanchang O-Film Tech Co., LTD. , Shenzhen O-Film Tech Co., LTD. , Suzhou O-Film Tech Co., LTD.
- 申请人地址: CN Nanchang City CN Shenzhen City CN Suzhou City
- 专利权人: Nanchang O-Film Tech Co., LTD.,Shenzhen O-Film Tech Co., LTD.,Suzhou O-Film Tech Co., LTD.
- 当前专利权人: Nanchang O-Film Tech Co., LTD.,Shenzhen O-Film Tech Co., LTD.,Suzhou O-Film Tech Co., LTD.
- 当前专利权人地址: CN Nanchang City CN Shenzhen City CN Suzhou City
- 优先权: CN201310243869.4 20130619
- 主分类号: B05C9/04
- IPC分类号: B05C9/04
摘要:
The present invention provides a substrate double-surface hole-filling apparatus for carrying out a hole-filling operation on a substrate which has a first surface and a second surface, comprises a first feeding device, a first scraping device, a first drying device, a second feeding device, a second scraping device, a second drying device and a turnover device. The substrate double-surface hole-filling apparatus has a turnover device turning over the substrate which needs to be carried out with hole-filling operation. Therefore, the substrate double-surface hole-filling apparatus can automatically carry out the hole-filling operation on two surfaces of the substrate without manual turnover of the substrate, thus improving production efficiency.
公开/授权文献
- US09751104B2 Apparatus for substrate double-surface hole-filling 公开/授权日:2017-09-05