A touch screen manufacturing method includes the following steps: providing a glass substrate; bombarding a surface of the glass substrate by plasma to expose Si—O-groups on the surface; coating and curing a jell on the surface of the glass substrate which is bombarded by plasma, forming a base material layer, the jell is bonded to the Si—O-groups on the glass substrate during curing; embossing the base material layer by embossing mold, forming a trench on the surface of the base material layer against the glass substrate; and filling metal into the trench, and forming metal mesh as a conductive layer. A touch screen is also disclosed. Compared to the traditional process using ITO as a conductive layer, mesh shape can be one-step formed, the process is simple, and the yield rate is high. And the cost is greatly reduced using metal instead of ITO, since not etching process is used, conductive material will not be wasted, and it reduces heavy metal emission in the waste.