Invention Application
- Patent Title: PHOTOMASK AND METHOD OF MANUFACTURING THE SAME
- Patent Title (中): 照相机及其制造方法
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Application No.: US14217976Application Date: 2014-03-18
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Publication No.: US20150010852A1Publication Date: 2015-01-08
- Inventor: Jong-Keun OH , Hyung-Ho KO , Byung-Gook KIM , Jae-Hyuck CHOI , Jun-Youl CHOI
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR10-2013-0077847 20130703
- Main IPC: G03F1/48
- IPC: G03F1/48
Abstract:
A photomask includes a transparent substrate, a mask pattern formed on the substrate, and a protective layer pattern covering side walls of the mask pattern, wherein a top of the protective layer pattern is exposed.
Public/Granted literature
- US09417518B2 Photomask and method of manufacturing the same Public/Granted day:2016-08-16
Information query
