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Invention Application
US20150010858A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION USED THEREIN, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE 有权
图案形成方法，使用其的抗紫外线敏感性或辐射敏感性组合物，电阻膜，使用其的电子器件的制造方法和电子器件

  • Patent Title: PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION USED THEREIN, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
  • Patent Title (中): 图案形成方法，使用其的抗紫外线敏感性或辐射敏感性组合物，电阻膜，使用其的电子器件的制造方法和电子器件
  • Application No.: US14497462
    Application Date: 2014-09-26
  • Publication No.: US20150010858A1
    Publication Date: 2015-01-08
  • Inventor: Hidenori TAKAHASHI
  • Applicant: FUJIFILM Corporation
  • Applicant Address: JP Tokyo
  • Assignee: FUJIFILM CORPORATION
  • Current Assignee: FUJIFILM CORPORATION
  • Current Assignee Address: JP Tokyo
  • Priority: JP2012-072541 20120327
  • Main IPC: G03F7/038
  • IPC: G03F7/038
PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE COMPOSITION USED THEREIN, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
Abstract:
There is provided a pattern forming method comprising (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive composition containing (A) a non-polymeric acid-decomposable compound having an aromatic ring and a molecular weight of 500 to 5,000 and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of performing development by using an organic solvent-containing developer to form a negative pattern.
Abstract(Chinese):

提供了一种图案形成方法，其包括（i）通过使用光化射线敏感或辐射敏感性组合物形成膜的步骤，所述组合物含有（A）具有芳环的非聚合酸可分解化合物和分子量为 500至5,000，和（B）能够在用光化射线或辐射照射时能产生酸的化合物; （ii）曝光该薄膜的步骤，和（iii）通过使用含有机溶剂的显影剂进行显影以形成负图形的步骤。

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