Invention Application
US20150013588A1 CRYSTALLIZATION PROCESSING FOR SEMICONDUCTOR APPLICATIONS 有权
半导体应用的结晶处理

  • Patent Title: CRYSTALLIZATION PROCESSING FOR SEMICONDUCTOR APPLICATIONS
  • Patent Title (中): 半导体应用的结晶处理
  • Application No.: US14495533
    Application Date: 2014-09-24
  • Publication No.: US20150013588A1
    Publication Date: 2015-01-15
  • Inventor: Stephen MOFFATT
  • Applicant: Applied Materials, Inc.
  • Main IPC: C30B13/24
  • IPC: C30B13/24 C30B29/40
CRYSTALLIZATION PROCESSING FOR SEMICONDUCTOR APPLICATIONS
Abstract:
A method and apparatus for forming a crystalline semiconductor layer on a substrate are provided. A semiconductor layer is formed by vapor deposition. A pulsed laser melt/recrystallization process is performed to convert the semiconductor layer to a crystalline layer. Laser, or other electromagnetic radiation, pulses are formed into a pulse train and uniformly distributed over a treatment zone, and successive neighboring treatment zones are exposed to the pulse train to progressively convert the deposited material to crystalline material.
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