Invention Application
- Patent Title: CRYSTALLIZATION PROCESSING FOR SEMICONDUCTOR APPLICATIONS
- Patent Title (中): 半导体应用的结晶处理
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Application No.: US14495533Application Date: 2014-09-24
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Publication No.: US20150013588A1Publication Date: 2015-01-15
- Inventor: Stephen MOFFATT
- Applicant: Applied Materials, Inc.
- Main IPC: C30B13/24
- IPC: C30B13/24 ; C30B29/40

Abstract:
A method and apparatus for forming a crystalline semiconductor layer on a substrate are provided. A semiconductor layer is formed by vapor deposition. A pulsed laser melt/recrystallization process is performed to convert the semiconductor layer to a crystalline layer. Laser, or other electromagnetic radiation, pulses are formed into a pulse train and uniformly distributed over a treatment zone, and successive neighboring treatment zones are exposed to the pulse train to progressively convert the deposited material to crystalline material.
Public/Granted literature
- US09290858B2 Crystallization processing for semiconductor applications Public/Granted day:2016-03-22
Information query
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