Invention Application
- Patent Title: METHOD FOR REGULATING PATTERNED PLASMONIC UNDERLAYER
- Patent Title (中): 用于调节图形等离子体底层的方法
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Application No.: US14055773Application Date: 2013-10-16
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Publication No.: US20150016774A1Publication Date: 2015-01-15
- Inventor: Ganping Ju , Chubing Peng , Xiaobin Zhu , Yingguo Peng , Yukiko A Kubota , Timothy J Klemmer , Jan-Ulrich Thiele , Michael A. Seigler , Werner Scholz , Kim Y. Lee , David S. Kuo , Koichi Wago
- Applicant: SEAGATE TECHNOLOGY LLC
- Applicant Address: US CA Cupertino
- Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee: SEAGATE TECHNOLOGY LLC
- Current Assignee Address: US CA Cupertino
- Main IPC: G02B6/26
- IPC: G02B6/26 ; F28F27/00
Abstract:
The embodiments disclose a stack feature of a stack configured to confine optical fields within and to a patterned plasmonic underlayer in the stack configured to guide light from a light source to regulate optical coupling.
Public/Granted literature
- US10310182B2 Patterned plasmonic underlayer Public/Granted day:2019-06-04
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