发明申请
- 专利标题： Shadow Mask for Patterned Deposition on Substrates
- 专利标题（中）： 阴影掩模用于图案沉积在底物上
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申请号： US14505256申请日： 2014-10-02
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公开(公告)号： US20150031148A1公开(公告)日： 2015-01-29
- 发明人: Indranil De , Kurt Weiner
- 申请人： Intermolecular, Inc.
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; H01L21/66
摘要：
A method for performing a physical vapor deposition (PVD) on a substrate is disclosed, comprising placing a substrate on a susceptor disposed below one or more PVD guns and below a plasma shield assembly having a bellows and a shadow mask coupled to a bottom side of the bellows, lowering the bellows toward the substrate to place the shadow mask in contact with the substrate; and depositing a material on an isolated region on the substrate through the shadow mask. In one implementation, the shadow mask may include a plate having openings in the shape of individual dies on the substrate, and a layer having openings in the shape of features patterned on the substrate, wherein the layer is coupled to a bottom surface of the plate by an epoxy.
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