发明申请
- 专利标题： METHOD FOR PRODUCING METAL OXIDE FILM AND METAL OXIDE FILM
- 专利标题（中）： 生产金属氧化物膜和金属氧化物膜的方法
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申请号： US14384603申请日： 2012-03-28
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公开(公告)号： US20150034885A1公开(公告)日： 2015-02-05
- 发明人: Takahiro Shirahata , Hiroyuki Orita , Takahiro Hiramatsu
- 申请人： Takahiro Shirahata , Hiroyuki Orita , Takahiro Hiramatsu
- 申请人地址： JP Tokyo
- 专利权人： TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- 当前专利权人： TOSHIBA MITSUBISHI-ELECTRIC INDUSTRIAL SYSTEMS CORPORATION
- 当前专利权人地址： JP Tokyo
- 国际申请： PCT/JP2012/058153 WO 20120328
- 主分类号： C23C18/12
- IPC分类号： C23C18/12 ; H01B1/08 ; C23C18/14
摘要：
In a method for producing a metal oxide film according to the present invention, a solution containing zinc is sprayed onto a substrate placed under non-vacuum, and then, a dopant solution containing a dopant is sprayed onto the substrate. After that, a deposited metal oxide film is subjected to a resistance reducing treatment. A molar concentration of the dopant supplied to the substrate with respect to a molar concentration of the zinc supplied to the substrate is not less than a predetermined value.
公开/授权文献
- US10351957B2 Method for producing metal oxide film and metal oxide film 公开/授权日：2019-07-16
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