发明申请
- 专利标题： METHODS FOR MANUFACTURING POLISHING PAD AND POLISHING APPARATUS
- 专利标题（中）： 制造抛光垫和抛光装置的方法
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申请号： US14455074申请日： 2014-08-08
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公开(公告)号： US20150047266A1公开(公告)日： 2015-02-19
- 发明人: CHUNG-CHIH FENG , I-PENG YAO , YUNG-CHANG HUNG , WEN-CHIEH WU
- 申请人： San Fang Chemical Industry Co., Ltd.
- 优先权： TW102129404 20130816
- 主分类号： B24D11/00
- IPC分类号： B24D11/00
摘要：
The present invention relates to a method for manufacturing a polishing pad. The method of the invention includes the steps of (a) providing a releasing carrier; (b) providing a foaming resin composition; (c) coating the foaming resin composition of the step (b) on the carrier of the step (a); and (d) curing the foaming resin composition of the step (c). The invention also provides a process for manufacturing a polishing apparatus.
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