Invention Application
- Patent Title: System and Method for Controlling Charge-up in an Electron Beam Apparatus
- Patent Title (中): 用于控制电子束装置中电荷的系统和方法
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Application No.: US14512672Application Date: 2014-10-13
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Publication No.: US20150060665A1Publication Date: 2015-03-05
- Inventor: Weiming Ren , Zhongwei Chen
- Applicant: Hermes Microvision Inc.
- Main IPC: H01J37/02
- IPC: H01J37/02 ; H01J37/28

Abstract:
The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.
Public/Granted literature
- US09000370B2 System and method for controlling charge-up in an electron beam apparatus Public/Granted day:2015-04-07
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