Invention Application
- Patent Title: METHOD AND APPARATUS FOR DIRECT FORMATION OF NANOMETER SCALED FEATURES
- Patent Title (中): 直接形成纳米尺度特征的方法和装置
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Application No.: US14487356Application Date: 2014-09-16
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Publication No.: US20150087136A1Publication Date: 2015-03-26
- Inventor: James Francis MACK , Stephen MOFFATT
- Applicant: Applied Materials, Inc.
- Main IPC: H01L21/306
- IPC: H01L21/306 ; H01L21/02 ; H01L21/768 ; H01L21/762 ; H01J37/32 ; C23C16/455
Abstract:
An apparatus and use of the apparatus to form nanometer sized features on a workpiece includes a plurality of individually biasable tips, and each tip has a diameter on the scale or 10 nm or less. By moving the tips above the surface of a workpiece in the presence of reactants, features can be directly formed on the workpiece on a sub-micron size, below the resolution of current photolithography. The features may be etched into a workpiece, or formed thereover.
Public/Granted literature
- US09466500B2 Method and apparatus for direct formation of nanometer scaled features Public/Granted day:2016-10-11
Information query
IPC分类:
