发明申请
- 专利标题: COMPOSITE POLISHING PAD AND METHOD FOR MAKING THE SAME
- 专利标题(中): 复合抛光垫及其制造方法
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申请号: US14500227申请日: 2014-09-29
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公开(公告)号: US20150093979A1公开(公告)日: 2015-04-02
- 发明人: CHUNG-CHIH FENG , I-PENG YAO , WEN-CHIEH WU , YUNG-CHANG HUNG
- 申请人: San Fang Chemical Industry Co., Ltd.
- 优先权: TW102135467 20131001
- 主分类号: B24B37/22
- IPC分类号: B24B37/22 ; B24D3/28
摘要:
The present invention relates to a composite polishing pad and a method for making the same. The composite polishing pad includes a cushion layer and a polishing layer. The cushion layer includes a first polymeric elastomer with a hardness of 10 to 70 shore D, and is attached to the polishing layer directly. The polishing layer includes a second polymeric elastomer with a hardness of 30 to 90 shore D, and has a polishing surface for polishing a workpiece. Whereby, the polishing layer will not peel off from the cushion layer easily, so that the polishing quality is raised.
公开/授权文献
- US09682457B2 Composite polishing pad and method for making the same 公开/授权日:2017-06-20
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