发明申请
US20150093979A1 COMPOSITE POLISHING PAD AND METHOD FOR MAKING THE SAME 有权
复合抛光垫及其制造方法

COMPOSITE POLISHING PAD AND METHOD FOR MAKING THE SAME
摘要:
The present invention relates to a composite polishing pad and a method for making the same. The composite polishing pad includes a cushion layer and a polishing layer. The cushion layer includes a first polymeric elastomer with a hardness of 10 to 70 shore D, and is attached to the polishing layer directly. The polishing layer includes a second polymeric elastomer with a hardness of 30 to 90 shore D, and has a polishing surface for polishing a workpiece. Whereby, the polishing layer will not peel off from the cushion layer easily, so that the polishing quality is raised.
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