发明申请
- 专利标题： SUBSTRATE PROCESSING APPARATUS, METHOD OF CONTROLLING SUBSTRATE PROCESSING APPARATUS, METHOD OF MAINTAINING SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
- 专利标题（中）： 基板处理装置，控制基板处理装置的方法，维护基板处理装置的方法和记录介质
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申请号： US14388648申请日： 2013-03-22
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公开(公告)号： US20150096494A1公开(公告)日： 2015-04-09
- 发明人: Susumu Nishiura , Kaori Inoshima , Hiroyuki Mitsui , Hiroshi Ekko
- 申请人： HITACHI KOKUSAI ELECTRIC INC.
- 申请人地址： JP Tokyo
- 专利权人： HITACHI KOKUSAI ELECTRIC INC.
- 当前专利权人： HITACHI KOKUSAI ELECTRIC INC.
- 当前专利权人地址： JP Tokyo
- 优先权： JP2012-082128 20120330
- 国际申请： PCT/JP2013/058323 WO 20130322
- 主分类号： C23C16/52
- IPC分类号： C23C16/52 ; C23C16/44
摘要：
A substrate processing apparatus includes: an operation unit, which is provided with a storage unit that stores a plurality of recipes including a recipe for processing a member that constitutes the inside of a reactor in which substrate processing is performed, and a recipe for processing an exhaust pipe through which a gas released from the inside of the reactor flows, the operation unit further being provided with a display unit that displays a setting condition for executing the recipes on an operation screen; and a control unit that executes the recipe that meets the setting condition. The operation unit includes a recipe control unit, which controls, based on the setting condition, execution of the recipe for processing the member constituting the inside of the reactor in which the substrate processing is performed, and the recipe for processing the exhaust pipe, among the recipes stored in the storage unit.
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