发明申请
- 专利标题： SEMICONDUCTOR DEVICE WITH NON-LINEAR SURFACE
- 专利标题（中）： 具有非线性表面的半导体器件
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申请号： US14046987申请日： 2013-10-06
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公开(公告)号： US20150097216A1公开(公告)日： 2015-04-09
- 发明人: Xiaomeng Chen , Zhiqiang Wu , Shih-Chang Liu , Chien-Hong Chen
- 申请人： Taiwan Semiconductor Manufacturing Company Limited
- 申请人地址： TW Hsin-Chu
- 专利权人： Taiwan Semiconductor Manufacturing Company Limited
- 当前专利权人： Taiwan Semiconductor Manufacturing Company Limited
- 当前专利权人地址： TW Hsin-Chu
- 主分类号： H01L29/04
- IPC分类号： H01L29/04 ; H01L21/02
摘要：
A semiconductor device includes a channel having a first linear surface and a first non-linear surface. The first non-linear surface defines a first external angle of about 80 degrees to about 100 degrees and a second external angle of about 80 degrees to about 100 degrees. The semiconductor device includes a dielectric region covering the channel between a source region and a drain region. The semiconductor device includes a gate electrode covering the dielectric region between the source region and the drain region.
公开/授权文献
- US09299768B2 Semiconductor device with non-linear surface 公开/授权日：2016-03-29
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