Invention Application
- Patent Title: METHOD FOR PATTERNED PLASMA-MEDIATED MODIFICATION OF THE CRYSTALLINE LENS
- Patent Title (中): 晶体镜的等离子体介质改性方法
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Application No.: US14576467Application Date: 2014-12-19
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Publication No.: US20150105763A1Publication Date: 2015-04-16
- Inventor: William Culbertson , Barry Seibel , Neil Friedman , Georg Schuele , Phillip Gooding
- Applicant: Optimedica Corporation
- Main IPC: A61F9/008
- IPC: A61F9/008

Abstract:
A system for treating a cataractous lens of a patient's eye includes a laser source for generating a light beam, a scanning system for deflecting the light beam to form a treatment pattern of the light beam, and a controller operably coupled to the laser source and scanning system and configured to operate the scanner to form the treatment pattern. The treatment pattern is a plurality of cuts in the form two or more different incision patterns for segmenting the lens tissue into a plurality of patterned pieces. The incision pattern includes: a first incision pattern including two or more crossing cut incision planes; and a second incision pattern comprising one or more laser incision each extending along a first length between a posterior and an anterior surface of the lens capsule.
Public/Granted literature
- US09968439B2 Method for patterned plasma-mediated modification of the crystalline lens Public/Granted day:2018-05-15
Information query
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