发明申请
US20150118444A1 METHODS OF MANUFACTURING SILICA-FORMING ARTICLES HAVING ENGINEERED SURFACES TO ENHANCE RESISTANCE TO CREEP SLIDING UNDER HIGH-TEMPERATURE LOADING
审中-公开
制造具有工程化表面的二氧化硅制品的方法，以提高耐高温加载下的缓冲滑动性
- 专利标题： METHODS OF MANUFACTURING SILICA-FORMING ARTICLES HAVING ENGINEERED SURFACES TO ENHANCE RESISTANCE TO CREEP SLIDING UNDER HIGH-TEMPERATURE LOADING
- 专利标题（中）： 制造具有工程化表面的二氧化硅制品的方法，以提高耐高温加载下的缓冲滑动性
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申请号： US14068840申请日： 2013-10-31
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公开(公告)号： US20150118444A1公开(公告)日： 2015-04-30
- 发明人: Don Mark Lipkin , Curtis Alan Johnson , Joshua Lee Margolies , Larry Steven Rosenzweig , Julin Wan
- 申请人： GENERAL ELECTRIC COMPANY
- 申请人地址： US NY Schenectady
- 专利权人： GENERAL ELECTRIC COMPANY
- 当前专利权人： GENERAL ELECTRIC COMPANY
- 当前专利权人地址： US NY Schenectady
- 主分类号： C04B41/00
- IPC分类号： C04B41/00 ; B05D5/00 ; B05D3/00 ; B05D1/02 ; B05D1/32 ; B05D3/06
摘要：
A method of forming an article includes forming a silicon-containing layer on a silicon-containing region of a surface of a substrate of the article; forming a plurality of channels and ridges in the silicon-containing layer; and forming at least one outer layer overlying the surface of the silicon-containing region. The plurality of channels and ridges may be formed by adding silicon-containing material to the silicon-containing layer. The channels and ridges may be formed by subtracting material from the silicon-containing layer. The channels and ridges may be formed by forming channels or grooves in the silicon-containing region of the surface of the substrate prior to formation of the silicon-containing layer.
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