发明申请
- 专利标题: SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- 专利标题(中): 半导体器件及其制造方法
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申请号: US14077019申请日: 2013-11-11
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公开(公告)号: US20150130049A1公开(公告)日: 2015-05-14
- 发明人: YING-JU CHEN , HSIEN-WEI CHEN
- 申请人: Taiwan Semiconductor Manufacturing Company Ltd.
- 申请人地址: TW Hsinchu
- 专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 当前专利权人: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
- 当前专利权人地址: TW Hsinchu
- 主分类号: H01L23/498
- IPC分类号: H01L23/498 ; H01L23/00
摘要:
A semiconductor device includes a carrier and a metallic structure including a metallic member, a pad and a via portion; wherein the metallic member is disposed inside the carrier, the pad is configured for receiving a solder bump and is disposed on a surface of the carrier, the via portion is configured for electrically connecting the metallic member and the pad, and the via portion is disposed proximal to an end of the pad. Further, a method of manufacturing a semiconductor device includes providing a carrier, removing a portion of the carrier for forming a via extending a surface of the carrier to an interior of the carrier, filling the via by a conductive material, and disposing the conductive material on the surface of the carrier, wherein the via is disposed proximal to an end portion of the conductive material.
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