发明申请
- 专利标题: Nonvolatile Memory Device Having a Current Limiting Element
- 专利标题(中): 具有限流元件的非易失性存储器件
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申请号: US14625867申请日: 2015-02-19
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公开(公告)号: US20150162530A1公开(公告)日: 2015-06-11
- 发明人: Yun Wang , Tony P. Chiang , Imran Hashim
- 申请人: Intermolecular Inc. , Kabushiki Kaisha Toshiba , SanDisk 3D LLC
- 主分类号: H01L45/00
- IPC分类号: H01L45/00 ; H01L27/24
摘要:
Embodiments of the invention generally include a method of forming a nonvolatile memory device that contains a resistive switching memory element that has an improved device switching performance and lifetime, due to the addition of a current limiting component disposed therein. In one embodiment, the current limiting component comprises at least one layer of resistive material that is configured to improve the switching performance and lifetime of the formed resistive switching memory element. The electrical properties of the formed current limiting layer, or resistive layer, are configured to lower the current flow through the variable resistance layer during the logic state programming steps (i.e., “set” and “reset” steps) by adding a fixed series resistance in the formed resistive switching memory element found in the nonvolatile memory device. Typically, resistive switching memory elements may be formed as part of a high-capacity nonvolatile memory integrated circuit, which can be used in various electronic devices, such as digital cameras, mobile telephones, handheld computers, and music players.
公开/授权文献
- US09299928B2 Nonvolatile memory device having a current limiting element 公开/授权日:2016-03-29
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