Invention Application
- Patent Title: Embossing Apparatus
- Patent Title (中): 压花装置
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Application No.: US14631378Application Date: 2015-02-25
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Publication No.: US20150174915A1Publication Date: 2015-06-25
- Inventor: Zvika Cohen , Eyal Peleg , Shahar Stein , Itzik Shaul
- Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
- Main IPC: B41J3/38
- IPC: B41J3/38

Abstract:
An embossing apparatus comprises an embossing die comprising a printed relief pattern, and a resilient surface for pressing media against the embossing die to emboss features corresponding to the printed relief pattern on the media, in which the printed relief pattern comprises a number of layers of a deposited material, and in which a number of layers of the deposited material closest to the top of the printed relief pattern comprises a deposited material with a relatively lower coefficient of adhesion than layers of the deposited material disposed under the deposited material closest to the top of the printed relief pattern. A printed relief pattern for embossing media comprises a number of preliminary layers, the preliminary layers comprising a first material, and a number of terminal layers, the terminal layers comprising a second material, in which the second material has a lower adhesive coefficient than the first material.
Public/Granted literature
- US09440453B2 Embossing apparatus Public/Granted day:2016-09-13
Information query
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