Invention Application
US20150185610A1 PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
有权
图案形成方法，丙烯酸敏感性或辐射敏感性树脂组合物，耐蚀膜，使用其的电子器件的制造方法和电子设备
- Patent Title: PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE
- Patent Title (中): 图案形成方法，丙烯酸敏感性或辐射敏感性树脂组合物，耐蚀膜，使用其的电子器件的制造方法和电子设备
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Application No.: US14605292Application Date: 2015-01-26
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Publication No.: US20150185610A1Publication Date: 2015-07-02
- Inventor: Shuji HIRANO , Natsumi YOKOKAWA , Hiroo TAKIZAWA , Wataru NIHASHI
- Applicant: FUJIFILM Corporation
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Priority: JP2012-167815 20120727; JP2013-054402 20130315
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/20 ; C08F212/32 ; C08F212/14 ; C08F222/14 ; G03F7/30 ; C08F220/28
Abstract:
There is provided a pattern forming method comprising, in order, (1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (Ab) a resin having specific repeating units, (2) a step of exposing the film by using an electron beam or an extreme-ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern.
Public/Granted literature
Information query
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