发明申请
- 专利标题： SUBSTRATE HEATING APPARATUS
- 专利标题（中）： 基座加热装置
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申请号： US14366573申请日： 2013-06-26
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公开(公告)号： US20150211792A1公开(公告)日： 2015-07-30
- 发明人: Yu Jiao , Yanming Wang , Qingyang Yao , Jie Liu
- 申请人： BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD.
- 专利权人： BOE TECHNOLOGY GROUP CO., LTD.
- 当前专利权人： BOE TECHNOLOGY GROUP CO., LTD.
- 优先权： CN201310144082.2 20130423
- 国际申请： PCT/CN2013/077954 WO 20130626
- 主分类号： F26B21/02
- IPC分类号： F26B21/02 ; F26B25/06 ; F26B21/14 ; F26B23/04 ; F26B21/12
摘要：
A substrate heating apparatus includes: a heating chamber, as well as a heating unit and a suspension holding unit which are provided in the heating chamber. The heating unit is provided at the bottom of the heating chamber, and the suspension holding unit holds the substrate in suspension above the heating unit. The apparatus avoids collision and friction on the substrate, and ensures uniform heating of the substrate.
公开/授权文献
- US09890998B2 Substrate heating apparatus 公开/授权日：2018-02-13
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