Invention Application
US20150221544A1 METHOD FOR SEPARATING AT LEAST TWO SUBSTRATES ALONG A SELECTED INTERFACE 有权
在选择的界面上分离最少两个基板的方法

  • Patent Title: METHOD FOR SEPARATING AT LEAST TWO SUBSTRATES ALONG A SELECTED INTERFACE
  • Patent Title (中): 在选择的界面上分离最少两个基板的方法
  • Application No.: US14424311
    Application Date: 2013-09-04
  • Publication No.: US20150221544A1
    Publication Date: 2015-08-06
  • Inventor: Didier LandruChristophe Figuet
  • Applicant: Soitec
  • Priority: FR1258403 20120907
  • International Application: PCT/IB2013/001937 WO 20130904
  • Main IPC: H01L21/762
  • IPC: H01L21/762
METHOD FOR SEPARATING AT LEAST TWO SUBSTRATES ALONG A SELECTED INTERFACE
Abstract:
A process for separating at least two substrates comprising at least two separation interfaces along one of the interfaces includes, before inserting a blade between the substrate, damaging at least one portion of a peripheral region of a chosen one of the interfaces, then inserting the blade and partially parting the substrates, and applying a fluid in a space between the parted substrates while the blade remains inserted therebetween, and decreasing a rupture energy of the chosen interface by stress corrosion involving breaking of siloxane bonds present at the interface.
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