发明申请
US20150252162A1 ANTI-MICROBIAL MODIFIED MATERIAL AND ANTI-MICROBIAL MODIFICATION METHOD
审中-公开
抗微生物修饰材料和抗微生物修饰方法
- 专利标题： ANTI-MICROBIAL MODIFIED MATERIAL AND ANTI-MICROBIAL MODIFICATION METHOD
- 专利标题（中）： 抗微生物修饰材料和抗微生物修饰方法
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申请号： US14327575申请日： 2014-07-10
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公开(公告)号： US20150252162A1公开(公告)日： 2015-09-10
- 发明人: Hsien-Yeh Chen , Chih-Hao Chang , Che-Wei Hsu , Ting-Ju Lin , Shu-Yun Yeh
- 申请人： National Taiwan University
- 优先权： TW103107464 20140305
- 主分类号： C08J7/12
- IPC分类号： C08J7/12 ; B05D3/06 ; B05D1/00
摘要：
The present invention concerns an anti-microbial modified material and an anti-microbial modification method, obtained by a bonding of a compound represented by formula (I) with a benzoyl-containing photoinitiator via a photoreaction. For the substrate surface modified by the anti-microbial modification method of the invention, the formation of the biofilm can be drastically diminished and a strong bactericidal capability may be afforded.
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