发明申请
- 专利标题: LASER PROCESSING APPARATUS AND LASER PROCESSING METHOD
- 专利标题(中): 激光加工设备和激光加工方法
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申请号: US14626850申请日: 2015-02-19
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公开(公告)号: US20150260985A1公开(公告)日: 2015-09-17
- 发明人: YOSHIRO KITAMURA , IZURU NAKAI
- 申请人: Panasonic Intellectual Property Management Co., Ltd.
- 优先权: JP2014-050470 20140313
- 主分类号: G02B26/10
- IPC分类号: G02B26/10 ; G02B27/09 ; G02B5/30 ; G02B27/28
摘要:
In a laser processing apparatus and a laser processing method, a laser beam radiated from a laser oscillator is positioned on one minute diffraction pattern or over two or more minute diffraction patterns provided in a diffraction optical element by a moving unit. A laser beam to which a desired beam profile is given is reflected at an angle in which the laser beam is radiated to a target position on a processed object by a scanning unit, and the laser beam is transmitted through the lens unit a position in the Z-axis direction of which is controlled so that a focal point of the lens unit corresponds to the surface of the processed object. The processed object is irradiated with a laser beam converged by the lens unit and having a desired laser beam profile to realize desired processing.
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