Invention Application
- Patent Title: EXTREME ULTRAVIOLET LIGHT GENERATION SYSTEM
- Patent Title (中): 极致超紫外光发生系统
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Application No.: US14724737Application Date: 2015-05-28
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Publication No.: US20150264793A1Publication Date: 2015-09-17
- Inventor: Osamu WAKABAYASHI , Tatsuya YANAGIDA , Hakaru MIZOGUCHI
- Applicant: GIGAPHOTON INC.
- Applicant Address: JP Tochigi-ken
- Assignee: GIGAPHOTON INC.
- Current Assignee: GIGAPHOTON INC.
- Current Assignee Address: JP Tochigi-ken
- Priority: JP2010-074256 20100329; JP2010-265791 20101129; JP2011-015695 20110127; JP2011-058026 20110316; JP2011-133112 20110615; JP2011-201750 20110915; JP2012-103580 20120427; JP2012-141079 20120622
- Main IPC: H05G2/00
- IPC: H05G2/00
Abstract:
An apparatus used with a laser apparatus may include a chamber, a target supply for supplying a target material to a region inside the chamber, a laser beam focusing optical system for focusing a laser beam from the laser apparatus in the region, and an optical system for controlling a beam intensity distribution of the laser beam.
Public/Granted literature
- US09402297B2 Extreme ultraviolet light generation system Public/Granted day:2016-07-26
Information query
