发明申请
- 专利标题: CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION
- 专利标题(中): 化学放大型阳离子型光敏树脂组合物
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申请号: US14662659申请日: 2015-03-19
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公开(公告)号: US20150268553A1公开(公告)日: 2015-09-24
- 发明人: Shota Katayama , Yasushi Washio , Takahiro Shimizu
- 申请人: Tokyo Ohka Kogyo Co., Ltd.
- 优先权: JP2014-059147 20140320
- 主分类号: G03F7/004
- IPC分类号: G03F7/004 ; G03F7/20
摘要:
A chemically amplified positive-type photosensitive resin composition capable of suppressing the phenomenon of footing in which the width of the bottom (the side proximal to the surface of a support) becomes narrower than that of the top (the side proximal to the surface of a resist layer) when a resist pattern serving as a template for a plated article is formed on a metal surface of a substrate using the composition. A mercapto compound is contained in the composition which includes an acid generator capable of producing an acid when irradiated with an active ray or radiation and a resin whose solubility in alkali increases under the action of acid.
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