Invention Application
- Patent Title: METHOD FOR DETECTING AN ETCHING RESIDUE
- Patent Title (中): 检测蚀刻残留的方法
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Application No.: US14349008Application Date: 2013-08-09
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Publication No.: US20150300950A1Publication Date: 2015-10-22
- Inventor: Linlin WANG , Xi CHEN , Shoukun WANG , Jianfeng YUAN
- Applicant: BOE TECHNOLOGY GROUP CO., LTD. , BEIJING BOE DISPLAY TECHNOLOGY CO., LTD.
- Priority: CN201310233393.6 20130613
- International Application: PCT/CN13/81147 WO 20130809
- Main IPC: G01N21/3563
- IPC: G01N21/3563 ; G01N21/956 ; G01N21/94
Abstract:
A method for detecting an etching residue is provided, comprising fitting a boundary of a pattern in a position to be detected by color difference of film layers, and positioning the pattern in the position to be detected, and acquiring the pattern in the position to be detected; testing the pattern in the position to be detected by an infrared spectroscopy, and obtaining an infrared spectrogram; and determining whether there exists the residue according to the infrared spectrogram.
Public/Granted literature
- US09176053B1 Method for detecting an etching residue Public/Granted day:2015-11-03
Information query
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