Invention Application
US20150301452A1 PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME
审中-公开
光电组合物和使用其制造显示器基板的方法
- Patent Title: PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME
- Patent Title (中): 光电组合物和使用其制造显示器基板的方法
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Application No.: US14503062Application Date: 2014-09-30
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Publication No.: US20150301452A1Publication Date: 2015-10-22
- Inventor: Jeong-Min Park , Jun Chun , Ji-Hyun Kim , Sung-Kyun Park , Jung-Soo Lee , Ki-Hyun Cho , Jin-Ho Ju , Chang-Ik Lee , Se-Tae Oh , Deok-Man Kang
- Applicant: Samsung Display Co., Ltd.
- Priority: KR10-2014-0046193 20140417
- Main IPC: G03F7/038
- IPC: G03F7/038 ; C23F1/02 ; C23F1/16 ; G03F7/16 ; G03F7/40
Abstract:
A chemically amplified photoresist composition is provided which includes: a solute including a novolac resin with an acid decomposable protecting group, a photoacid generator, and an organic solvent.
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