- 专利标题： Organosiloxane Films for Gas Separations
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申请号： US14792255申请日： 2015-07-06
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公开(公告)号： US20150306549A1公开(公告)日： 2015-10-29
- 发明人: Ashok K. Sharma
- 申请人： Applied Membrane Technology, Inc.
- 主分类号： B01D69/12
- IPC分类号： B01D69/12 ; B01D63/02 ; C01B13/02 ; B01D71/70 ; C01B21/04 ; B05D1/00 ; B01D67/00
摘要：
A semipermeable gas separation membrane is plasma deposited from liquid organosiloxane monomer having at least three silicon atoms and an alpha hydrogen atom. The semipermeable membrane may be employed as a gas-selective membrane in combination with a porous substrate.
公开/授权文献
- US09339770B2 Organosiloxane films for gas separations 公开/授权日：2016-05-17
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