发明申请
- 专利标题： METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND METHOD OF MAINTAINING DEPOSITION APPARATUS
- 专利标题（中）： 制造半导体器件的方法和保存沉积装置的方法
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申请号： US14578940申请日： 2014-12-22
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公开(公告)号： US20150311062A1公开(公告)日： 2015-10-29
- 发明人: Dong Yul LEE , Sang Heon HAN , Seung Hyun KIM , Jang Mi KIM , William SOLARI , Hyun Wook SHIM , Suk Ho YOON
- 申请人： Dong Yul LEE , Sang Heon HAN , Seung Hyun KIM , Jang Mi KIM , William SOLARI , Hyun Wook SHIM , Suk Ho YOON
- 优先权： KR10-2014-0050270 20140425
- 主分类号： H01L21/02
- IPC分类号： H01L21/02 ; H01L33/00
摘要：
A method of manufacturing a semiconductor device, includes forming an aluminum compound film on a surface of a process chamber by supplying an aluminum (Al) source to the process chamber, the surface contacting the aluminum source in the process chamber; disposing a wafer on a susceptor provided in the process chamber after forming the aluminum compound film; and forming a thin film for the semiconductor device on the wafer.
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