发明申请
US20150331331A1 DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
审中-公开
检测装置,光刻装置和制品制造方法
- 专利标题: DETECTION APPARATUS, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
- 专利标题(中): 检测装置,光刻装置和制品制造方法
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申请号: US14710882申请日: 2015-05-13
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公开(公告)号: US20150331331A1公开(公告)日: 2015-11-19
- 发明人: Koichi Sentoku , Wataru Yamaguchi , Toshihiko Nishida , Hideki Ina
- 申请人: CANON KABUSHIKI KAISHA
- 优先权: JP2014-102990 20140519
- 主分类号: G03F7/20
- IPC分类号: G03F7/20 ; G01B11/14
摘要:
Provided is a detection apparatus that detects a mark with a periodic structure and includes an illumination optical system configured to irradiate light on the mark; a light receiving optical system configured to receive a diffracted light from the mark when a relative position between the illumination optical system and the mark is changed in the measurement direction; and a photodetector configured to detect the diffracted light from the light receiving optical system. Here, a numerical aperture of the light receiving optical system in the measurement direction is larger than a numerical aperture of the light receiving optical system in the non-measurement direction in the plane on which the mark is formed.
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